Replenish and Relax: Explaining Logarithmic Annealing in Ion-Implanted c-Si

Citation:

Laurent Karim Beland, Anahory, Yonathan , Smeets, Dries , Guihard, Matthieu , Brommer, Peter , Joly, Jean-Francois , Pothier, Jean-Christophe , Lewis, Laurent J. , Mousseau, Normand , and Schiettekatte, Francois . 2013. “Replenish And Relax: Explaining Logarithmic Annealing In Ion-Implanted C-Si”. Physical Review Letters, 111, 10. doi:10.1103/PhysRevLett.111.105502.

Abstract:

We study ion-damaged crystalline silicon by combining nanocalorimetric experiments with an off-lattice kinetic Monte Carlo simulation to identify the atomistic mechanisms responsible for the structural relaxation over long time scales. We relate the logarithmic relaxation, observed in a number of disordered systems, with heat-release measurements. The microscopic mechanism associated with this logarithmic relaxation can be described as a two-step replenish and relax process. As the system relaxes, it reaches deeper energy states with logarithmically growing barriers that need to be unlocked to replenish the heat-releasing events leading to lower-energy configurations.